Titanium tungsten sputtering targets are a versatile material employed in numerous industrial processes. Their exceptional properties, such as high hardness, wear resistance, and low coefficient of friction, make them ideal for applications requiring durable and robust coatings. These targets seamlessly deposit thin films through physical vapor dep

Gold sputtering targets are essential components in various thin-film deposition processes, owing to their exceptional attributes. These targets, often made of high-purity gold, are used in a sputtering system to generate an ionized plasma that deposits a thin layer of gold onto a substrate. The resulting gold films exhibit remarkable durability, m